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Nanoparticulate film deposition via reactive atmospheric pressure | 12141
Journal of Physical Chemistry & Biophysics

Journal of Physical Chemistry & Biophysics
Open Access

ISSN: 2161-0398

+44 1478 350008

Nanoparticulate film deposition via reactive atmospheric pressure plasma


5th International Conference on Theoretical and Applied Physics

July 02-03, 2018 | Vienna, Austria

Jing Zhang, Yu Xu, Tao He, Yu Zhang, Chaoliang Wang, Ying Guo, Qinyu Yang, Ke Ding and Jianjun Shi

Donghua University, China

Posters & Accepted Abstracts: J Phys Chem Biophys

Abstract :

In recent years, non-thermal reactive atmospheric pressure plasma has attracted a lot of research attention for film deposition in a continuous way. The plasma is composed of charged particles and excited neutrals with high reactive energy. It can provide a unique environment for chemical reactions and film growth, which is distinct from the ordinary condensed chemical reaction driven by a single hot source. All the reactions are far from chemical equilibrium and take place at low gas temperature. It shows great potential industry applications in temperature-sensitive substrates. Inorganic, organic/inorganic hybrid, polymeric nanoparticulate films such as TiO2, SiCxOyHz and fluorocarbon polymers have been deposited on different substrates through kHz or RF reactive atmospheric pressure plasma discharge.The film structure and morhoplogies have been analyzed through FE-SEM, ATR-FTIR, XRD and TEM. The atmophseric pressure stable dishcarge and deposition processes have also been investigated by OES or I-V characteristics, etc. Some applications of the films in new energy or surface modifications are also discussed

Biography :

E-mail:

jingzh@du.edu.cn

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