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Germanium for photonic applications | 3466
Journal of Physical Chemistry & Biophysics

Journal of Physical Chemistry & Biophysics
Open Access

ISSN: 2161-0398

Germanium for photonic applications


International Conference and Trade fair on Laser Technology

July 20-22, 2015 Orlando, Florida, USA

F. Y. Gardes, C. G. Littlejohns, T. Dominguez Bucio, M. Nedeljkovic, J. Soler Penades, C. J. Mitchell, A. Z. Khokhar, G. T. Reed and G. Z. Mashanovich

Posters-Accepted Abstracts: J Phys Chem Biophys

Abstract :

Polycrystalline and crystalline germanium have been demonstrated to be excellent materials for the fabrication of integrated microsystems in complementary metal oxide semiconductor (CMOS) micro-electromechanical systems (MEMS) and photonics. Crystalline Germanium or Silicon Germanium on silicon or insulator is also a desirable and preferred system for applications in near infrared and mid infrared photonic devices. For near infrared, Silicon Germanium is crucial for the fabrication of detectors QCSE modulators and detectors and Franz Keldysh modulators. When extended to mid infrared wavelengths, Germanium becomes one of the wave guiding media of choice, with optical transmission all the way up to 10 microns. In order to fabricate optical components and enable the confinement of light in the horizontal and vertical direction, the deposition of high quality crystalline Germanium on insulator is of utmost importance. In this paper we demonstrate a novel way to obtain crystalline Germanium and Silicon Germanium on insulator for near infrared devices and we introduce a new platform for the fabrication of mid infrared integrated circuits.

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